PaperPenultimate effect in radical copolymerization of 2- trifluoromethylacrylatesHiroshi Ito, Brian C. Trinque, et al.J Polym Sci Part A
ReviewDevelopment of new advanced resist materials for microlithographyHiroshi ItoJ. Photopolym. Sci. Tech.
ReviewAdvances in chemical amplification resist systemsHiroshi ItoJapanese Journal of Applied Physics
PaperThermally Developable, Positive Tone, Oxygen RIE Barrier Resist for Bilayer LithographyHiroshi Ito, Mitsuru Ueda, et al.JES