ReviewChemical amplification resists: Laboratory curiosity to paradigmHiroshi ItoJ. Photopolym. Sci. Tech.
Conference paperFundamentals of developer-resist interactions for line-edge roughness and critical dimension control in model 248 nm and 157 nm photoresistsVivek M. Prabhu, Michael X. Wang, et al.Microlithography 2004
Conference paper1X deep UV lithography with chemical amplification for 1-micron DRAM productionJohn G. Maltabcs, Steven J. Holmes, et al.Microlithography 1990
Conference paperRational design in cyclic olefin resists for sub-100nm lithographyWenjie Li, P. Rao Varanasi, et al.Microlithography 2003
