Conference paper
A high-density SRAM design technique using silicon nanowire FETs
Yi-Bo Liao, Meng-Hsueh Chiang, et al.
LISS 2011
Paper
Random dopant fluctuation in limited-width FinFET technologies
Abstract
In this brief, the random-dopant-fluctuation (RDF) effects in FinFET devices are investigated via physical analyses and numerical simulations. Our results show that extremely scaled devices, particularly FinFETs with narrow device width (fin height) in each individual fin, are susceptible to RDF effects. Even in an ideally "undoped"silicon channel, the existence of unintended impurity dopants of acceptors and donors will still have a significant impact on device characteristics. The implication from RDF for design is also discussed. © 2007 IEEE.
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