S. Cohen, J.C. Liu, et al.
MRS Spring Meeting 1999
The reactive sticking coefficient, SR, of SiH4 on the Si (111)-(7×7) surface has been studied as a function of hydrogen coverage (ΘH) in the temperature range from 100 to 500 °C. Evidence is seen for two adsorption regimes which are proposed to correspond to minority and majority surface sites. On the minority sites (ΘH=0 to 0.08), SR is approximately 10-5 and essentially no dependence of SR on surface temperature, TS, is found. Reactive sticking becomes a complicated function of TS and ΘH, with SR decreasing, on the majority sites (ΘH≫008). © 1989.
S. Cohen, J.C. Liu, et al.
MRS Spring Meeting 1999
R.C. Taylor, M.M. Plechaty, et al.
Physica C: Superconductivity and its applications
M. Liehr, S. Gates, et al.
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
J.B. Miller, H.R. Siddiqui, et al.
The Journal of Chemical Physics