Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
The resistance of planar barriers is discussed for a variety of situations in which different sources of scattering act incoherently, allowing a semiclassical approach. This includes single barriers, a sequence of identical parallel barriers, and identical barriers at random angles simulating grain boundaries. Existing results are related, and only limited extension of these is provided. The case of a single barrier embedded in a uniformly resistive medium has been treated by Kunze and others. Kunze's analysis is validated and interpreted via a considerably simplified version of his model. © 1995 The American Physical Society.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Frank Stem
C R C Critical Reviews in Solid State Sciences
Shu-Jen Han, Dharmendar Reddy, et al.
ACS Nano
U. Wieser, U. Kunze, et al.
Physica E: Low-Dimensional Systems and Nanostructures