PaperEffects of mask materials on near field optical nanolithographySharee J. McNab, Richard J. BlaikieMaterials Research Society Symposium - Proceedings
PaperIon beam patterning of block copolymer thin filmsRanulfo Allen, John Baglin, et al.J. Photopolym. Sci. Tech.
PaperESR and optical absorption of bound-small polarons in YAlO3O.F. Schirmer, K.W. Blazey, et al.Physical Review B
PaperDesigning catalysts with deep generative models and computational data. A case study for Suzuki cross coupling reactionsOliver Schilter, Alain Vaucher, et al.Digital Discovery
