Conference paperNEW RELIABLE STRUCTURE FOR HIGH TEMPERATURE MEASUREMENT OF SILICON WAFERS USING A SPECIALLY ATTACHED THERMOCOUPLE.S. Cohen, T.O. Sedgwick, et al.MRS Proceedings 1983
PaperMichael Hatzakis, semiconductor industry pioneerJ. Paraszczak, J.M. Shaw, et al.Micro and Nano Engineering
PaperPersistent spectral hole burning in deuterated (formula presented)R.M. Macfarlane, R.L. ConePhysical Review B - CMMP
Conference paperX-ray lithography induced radiation effects in deep submicron CMOS devicesL.K. Wang, A. Acovic, et al.MRS Spring Meeting 1993