U. Köster, K.N. Tu, et al.
Applied Physics Letters
We demonstrate here that bilayer films consisting of Si and transition metals with a layer thickness of 15-40 nm are promising materials for archival optical storage. They show a large optical reflectivity change before and after silicide formation, have a long lifetime at room temperature, and are nontoxic.
U. Köster, K.N. Tu, et al.
Applied Physics Letters
H. Takai, K.N. Tu
Physical Review B
H.K. Liou, X. Wu, et al.
Applied Physics Letters
D.A. Smith, K.N. Tu, et al.
Ultramicroscopy