Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
A study was conducted to control the structural symmetry and periodicity of a self-assembled block copolymer in a nanopattern template. Block copolymers show nano-sized structures and have the ability to undergo morphological reformation under various external fields. A method was analyzed, which was based on confining surface pinned micelles consisting of poly(styrene-block-4- hydroxystyrene) (PS-b-PHOST) onto topographically patterned silicon oxide substrates. The PHOST blocks have strong affinity to the substrate through the hydrogen bonding between hydroxyl groups of PHOST and the oxide surface. Atomic force microscopy (AFM) was employed to determine the surface morphology and height variation of copolymers. A dynamic Monte Carlo (MC) method was used to simulate the system of polymer chains grafted to a solid surface. Results show that topographic pre-pattern allows precise control of spatial arrangement of pinned micelles that enables the fabrication of periodic nano-arrays.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Ranulfo Allen, John Baglin, et al.
J. Photopolym. Sci. Tech.
Biancun Xie, Madhavan Swaminathan, et al.
EMC 2011
S. Cohen, J.C. Liu, et al.
MRS Spring Meeting 1999