Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
The issues of device stability and reliability which are inevitably encountered in the course of development of any new technology must be summarily dealt with. The development of organic and polymeric nonlinear optical media is no exception. This field has now evolved into a stage wherein solutions to a few performance issues are of crucial importance. This discussion focuses on two of these critical problems. The first is a preliminary study intended to identify some of the variables involved in optical damage, and the second involves the recent effort on chromophores.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
John G. Long, Peter C. Searson, et al.
JES
S.J. Wind, Y. Taur, et al.
MRS Spring Meeting 1995
E. Burstein
Ferroelectrics