PaperAdsorption kinetics of SiH4, Si2H6 and Si3H8 on the Si(111)-(7×7) surfaceStephen M. GatesSurface Science
PaperEffect of plasma interactions with low-κ films as a function of porosity, plasma chemistry, and temperatureMarcus A. Worsley, Stacey F. Bent, et al.Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperDetection of open or closed porosity in low-κ dielectrics by solvent diffusionMarcus A. Worsley, Mark Roberts, et al.Microelectronic Engineering
PaperSilicon Chemical Vapor Deposition One Step at a Time: Fundamental Studies of Silicon Hydride ChemistryJoseph M. Jasinski, Stephen M. GatesAccounts of Chemical Research
