Hiroshi Ito, Klaas Schildknegt, et al.
Microlithography 1991
A report is presented on the thermal decomposition behavior of several polymethacrylates and the effect of the ester structure on the thermolysis in correlation with the photosensitivity in acid-catalyzed thermolysis. Differential scanning calorimetry (DSC) curves of the polymethacrylates and presented together with that of PMAA Polymethacrylic Acid PMAA loses absorbed water below 140°C (1st heating), and then dehydrates to form PMAN, at the temperature ranging from 180 to 260°C.
Hiroshi Ito, Klaas Schildknegt, et al.
Microlithography 1991
F.A. Houle, D.C. Miller, et al.
J. Photopolym. Sci. Tech.
Hiroshi Ito, M.H. Sherwood
SPIE Advances in Resist Technology and Processing 1999
W.D. Hinsberg, Scott A. MacDonald, et al.
ACS Spring 1991