K.A. Chao
Physical Review B
Accurate measurement of inversion thickness is essential in ULSI technology for development and control of ultra-thin gate dielectric processes. However, the accuracy of the measurement can be severely affected by the high gate leakage current and series resistance. This paper presents a methodology to reduce the measurement error by optimizing the ac modulation frequency and test device structures.
K.A. Chao
Physical Review B
Julien Autebert, Aditya Kashyap, et al.
Langmuir
Corneliu Constantinescu
SPIE Optical Engineering + Applications 2009
H.D. Dulman, R.H. Pantell, et al.
Physical Review B