Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
The classes of sequences generated by time- and space- restricted multiple counter machines are compared to the corresponding classes generated by similarly restricted multiple tape Turing machines. Special emphasis is placed on the class of sequences generable by machines which operate in real time. Real-time Turing machines are shown to be strictly more powerful than real-time counter machines. A number of questions which remain open for real-time Turing machines are settled for real-time counter machines. © 1970 Academic Press, Inc.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Mario Blaum, John L. Fan, et al.
IEEE International Symposium on Information Theory - Proceedings
Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011
Jonathan Ashley, Brian Marcus, et al.
Ergodic Theory and Dynamical Systems