A highly etch resistant, negative resist for deep-UV and electron beam lithography
- Dennis R. McKean
- Nicholas J. Clecak
- et al.
- 1990
- Microlithography 1990
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7 results for Lester A. Pederson
Sensitive electron beam resist systems based on acid-catalyzed deprotection
- Hiroshi Ito
- Lester A. Pederson
- et al.
- 1989
- Proceedings of SPIE 1989
Zero-Misalignment lithographic process using a photoresist with wavelength-selected tone
- William D. Hinsberg
- Scott A. MacDonald
- et al.
- 1989
- Proceedings of SPIE 1989
Structural Composition of Polymers Relative to Their Plasma Etch Characteristics
- Lester A. Pederson
- 2019
- JES
A Sensitive, Etch Resistant, Positive Tone E-Beam Resist System
- Hiroshi Ito
- L.A. Pederson
- et al.
- 2019
- JES
Characterization of a Photoresist with Wavelength Selected Tone
- Lester A. Pederson
- Andrew R. Neureuther
- et al.
- 1990
- IEEE T-ED
Compositional Analyses of Methyl Methacrylate-Methacrylic Acid Copolymers by Carbon-13 Nuclear Magnetic Resonance Spectrometry
- Duane E. Johnson
- James R. Lyerla
- et al.
- 1977
- Analytical Chemistry