Predicting in-plane distortion from electron-beam lithography on x-ray mask membranes
- D.L. Laird
- R. Engelstad
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
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19 results for R.E. Acosta
Image placement errors in x-ray masks induced by changes in resist stress during electron-beam writing
- R.E. Acosta
- Denise Puisto
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Annealing behavior of gold absorber in x-ray masks
- R.E. Acosta
- W.A. Johnson
- et al.
- 1992
- Microelectronic Engineering
Copper exchange plating on palladium and its relation to circuit repair
- R.J. Von Gutfeld
- D.R. Vigliotti
- et al.
- 1991
- Applied Physics Letters
X-ray mask distortion due to radiation damage
- R.E. Acosta
- 1991
- Microelectronic Engineering
Fully scaled 0.5μm MOS circuits by synchrotron radiation X-ray lithography: Mask fabrication and chraterization
- R. Viswanathan
- R.E. Acosta
- et al.
- 1989
- Microelectronic Engineering
Distortion of masks for x-ray lithography
- R.E. Acosta
- J.R. Maldonado
- et al.
- 1985
- Microelectronic Engineering
Characterization of stress in the absorber of x-ray masks using a holographic technique
- R.E. Acosta
- A.D. Wilson
- et al.
- 1985
- Microelectronic Engineering
Coercive force of electrodeposited NiFe on top of conductors for SLM bubble device applications
- L. Romankiw
- M.C. Blakeslee
- et al.
- 1978
- IEEE Transactions on Magnetics