Application of variable shaped electron beam technology to the development of 0.5 micron CMOS technology with extensions to 0.25 micron
- P. Coane
- P. Rudeck
- et al.
- 1989
- Microelectronic Engineering
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15 results for Alan Wilson
Distortion of masks for x-ray lithography
- R.E. Acosta
- J.R. Maldonado
- et al.
- 1985
- Microelectronic Engineering
Characterization of stress in the absorber of x-ray masks using a holographic technique
- R.E. Acosta
- A.D. Wilson
- et al.
- 1985
- Microelectronic Engineering
Electron-Beam Systems for Precision Micron and Submicron Lithography
- Alan D. Wilson
- 1983
- Proceedings of the IEEE
1 μm MOSFET VLSI Technology: Part VI—Electron-Beam Lithography
- Warren D. Grobman
- Hans E. Luhn
- et al.
- 1979
- IEEE T-ED