Design of a positive resist for projection lithography in the mid‐UV
- Grant Willson
- Robert Miller
- et al.
- 2004
- Polymer Engineering & Science
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34 results for D.R. McKean
Synthesis and Properties of Diazopiperidiones for Use in Nonchemically Amplified Deep UV Photoresists
- Peter I. Tattersall
- David Breslin
- et al.
- 2004
- Chemistry of Materials
The effect of polymer structure on the efficiency of acid generation from triarylsulfonium salts
- Dennis R. McKean
- Ulrich P. Schaedeli
- et al.
- 2003
- Journal of Polymer Science Part A: Polymer Chemistry
Ring Opening of Cyclopropyl Ketones by Trimethylsilyl Iodide
- Robert D. Miller
- Dennis R. McKean
- 2002
- Journal of Organic Chemistry
Characterization of a Novolac-Based Three-Component Deep-UV Resist
- Dennis R. McKean
- Scott A. MacDonald
- et al.
- 2002
- Chemistry of Materials
The rational design of bleachable non-chemically amplified DUV photoactive compounds
- Benjamen M. Rathsack
- Peter I. Tattersall
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Preparation of thermally labile PMMA particles by combined non-aqueous dispersion polymerization and polymer chain transfer
- S.A. Srinivasan
- J.L. Hedrick
- et al.
- 1998
- Polymer
Thick film positive photoresist: development and resolution enhancement technique
- D.R. McKean
- T.P. Russell
- et al.
- 1995
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Base-catalyzed photosensitive polyimide
- Dennis R. McKean
- Gregory M. Waliraff
- et al.
- 1993
- Microlithography 1993
Base-catalyzed photosensitive polyimide
- D.R. McKean
- G.M. Wallraff
- et al.
- 1991
- ACS Spring 1991