Interactions in Mixtures of Poly(ethylene oxide) and Poly(methyl methacrylate)
- Hiroshi Ito
- T.P. Russell
- et al.
- 2002
- Macromolecules
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127 results for Hiroshi Ito
Neutron and X-ray Scattering Studies on Semicrystalline Polymer Blends
- T.P. Russell
- Hiroshi Ito
- et al.
- 2002
- Macromolecules
Plasma-Developable Photoresist Systems Based on Chemical Amplification
- Scott A. MacDonald
- Hiroshi Ito
- et al.
- 2002
- Chemistry of Materials
Aliphatic platforms for the design of 157 nm chemically amplified resists
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Polymer design for 157 nm chemically amplified resists
- Hiroshi Ito
- Greg M. Wallraff
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Post-modification as a way to improve the lithographic performance of resist materials
- Wenjie Li
- P. Rao Varanasi
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Characterization of new aromatic polymers for 157 nm photoresist applications
- N. Fender
- P.J. Brock
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
193nm single layer resist materials: Total consideration on design, physical properties, and lithographic performances on all major alicyclic platform chemistries
- T. Kajita
- Y. Nishimura
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Experimental approaches for assessing interfacial behavior of polymer films during dissolution in aqueous base
- William Hinsberg
- Seok-Won Lee
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Dissolution behavior of chemically amplified resist polymers for 248-, 193-, and 157-nm lithography
- Hiroshi Ito
- 2001
- IBM J. Res. Dev