Electronic Excitation in Poly(di-n-hexylsilane)
- Kenneth A. Klingensmith
- John W. Downing
- et al.
- 2002
- JACS
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11 results for John Downing
Design of chromophores for nonlinear optical applications
- D.M. Burland
- J.E. Rice
- et al.
- 1991
- SPIE San Diego 1991
Polysilanes: solution photochemistry and deep UV lithography
- R.D. Miller
- G.M. Wallraff
- et al.
- 1988
- ACS PMSE 1988
Polysilanes: photochemistry and deep UV lithography
- R.D. Miller
- G.M. Wallraff
- et al.
- 1988
- SPE Regional Technical Conference 1988
SEMIEMPIRICAL CALCULATIONS OF ELECTRONIC SPECTRA: USE IN THE DESIGN OF MID-UV SENSITIZERS.
- R.D. Miller
- D.R. McKean
- et al.
- 1983
- ACS National Meeting 1983
Highly strained single and double bonds
- Josef Michl
- George J. Radziszewski
- et al.
- 2009
- Pure and Applied Chemistry
Bridgehead double bonds
- Robert D. Miller
- Juliusz G. Radziszewski
- et al.
- 2009
- Pure and Applied Chemistry
Solution photochemistry of poly(dialkylsilanes): A new class of photoresists
- Josef Michl
- John W. Downing
- et al.
- 2009
- Pure and Applied Chemistry
Design of a positive resist for projection lithography in the mid‐UV
- Grant Willson
- Robert Miller
- et al.
- 2004
- Polymer Engineering & Science
Polysilanes: Photochemistry and deep UV lithography
- R.D. Miller
- G.M. Wallraff
- et al.
- 2004
- Polymer Engineering & Science