Simultaneous fabrication of RF MEMS switches and resonators using copper-based CMOS interconnect manufacturing methods
- C.V. Jahnes
- J.M. Cotte
- et al.
- 2004
- MEMS 2004
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24 results for David Seeger
Extension of 248 nm optical lithography: A thin film imaging approach
- Qinghuang Lin
- Ahmad D. Katnani
- et al.
- 1998
- Microlithography 1998
A new family of non-chemically amplified resists
- Ari Aviram
- Marie Angelopoulos
- et al.
- 1998
- Microlithography 1998
Nonchemically amplified positive photoresist for synchrotron radiation x-ray lithography
- Daniel Bucca
- A. Aviram
- et al.
- 1995
- Microlithography 1995
0.25-μm lithography development using positive mode top surface imaging photoresist
- Douglas C. La Tulipe
- John P. Simons
- et al.
- 1994
- Microlithography 1994
Optimization of ESCAP photoresist for x-ray lithography
- A.T.S. Pomerene
- K.E. Petrillo
- et al.
- 1994
- Microlithography 1994
Photoresist process latitude optimization for synchrotron x-ray lithography
- Andrew T. Pomerene
- David E. Seeger
- et al.
- 1993
- Microlithography 1993
A 0.5 μm fully scaled two-level metal fully planarized interconnect structure fabricated with X-ray lithography
- D. Moy
- L.K. Wang
- et al.
- 1990
- VLSI Technology 1990
0.5 μm CMOS devices and circuits fabricated using synchrotron X-ray lithography
- L.K. Wang
- C.H. Hsu
- et al.
- 1989
- VLSI Technology 1989
COMPARATIVE STUDY OF THE PHOTOCHEMISTRY OF THE CUTTING (ETCHING) OF A SYNTHETIC POLYMER AND BOVINE CORNEA BY EXCIMER LASER RADIATION.
- R. Srinivasan
- Bodil Braren
- et al.
- 1984
- CLEO 1984