Simultaneous fabrication of RF MEMS switches and resonators using copper-based CMOS interconnect manufacturing methods
- C.V. Jahnes
- J.M. Cotte
- et al.
- 2004
- MEMS 2004
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24 results for David Seeger
Fabrication challenges for next-generation devices: Microelectromechanical systems for radio-frequency wireless communications
- David Seeger
- Jennifer Lund
- et al.
- 2003
- Journal of Microlithography, Microfabrication and Microsystems
Photochemical Cleavage of a Polymeric Solid: Details of the Ultraviolet Laser Ablation of Poly(methyl methacrylate) at 193 and 248 nm
- R. Srinivasan
- Bodil Braren
- et al.
- 2002
- Macromolecules
Fabrication challenges for next generation devices: MEMS for RF wireless communications
- David Seeger
- Jennifer Lund
- et al.
- 2002
- Proceedings of SPIE - The International Society for Optical Engineering
A new family of non-chemically amplified resists
- Ari Aviram
- Marie Angelopoulos
- et al.
- 1998
- Microlithography 1998
Extension of 248 nm optical lithography: A thin film imaging approach
- Qinghuang Lin
- Ahmad D. Katnani
- et al.
- 1998
- Microlithography 1998
Thin-film imaging: Past, present, prognosis
- David Seeger
- D.C. La Tulipe Jr.
- et al.
- 1997
- IBM J. Res. Dev
Diazoquinone positive photoresist for x-ray lithography
- A. Aviram
- Daniel Bucca
- et al.
- 1995
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Nonchemically amplified positive photoresist for synchrotron radiation x-ray lithography
- Daniel Bucca
- A. Aviram
- et al.
- 1995
- Microlithography 1995
0.25-μm lithography development using positive mode top surface imaging photoresist
- Douglas C. La Tulipe
- John P. Simons
- et al.
- 1994
- Microlithography 1994