Optimization of ESCAP photoresist for x-ray lithography
- A.T.S. Pomerene
- K.E. Petrillo
- et al.
- 1994
- Microlithography 1994
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11 results for A.T.S. Pomerene
Photoresist process latitude optimization for synchrotron x-ray lithography
- Andrew T. Pomerene
- David E. Seeger
- et al.
- 1993
- Microlithography 1993
Practical characterization of 0.5 μm optical lithography
- Donis G. Flagello
- Andrew T. S. Pomerene
- 1989
- Proceedings of SPIE 1989
GaAs MESFET 16 × 16 crosspoint switch at 1700 Mbits/sec
- C.J. Anderson
- J.H. Magerlein
- et al.
- 1987
- GaAs IC 1987
Patterning of 100 nm features using X-ray lithography
- Azalia A. Krasnoperova
- Scott Hector
- et al.
- 1997
- J. Photopolym. Sci. Tech.
Lithography and fabrication processes for sub-100 nm scale complementary metal-oxide semiconductor
- S.J. Wind
- Y. Taur
- et al.
- 1995
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Fabrication of high performance 512Kb SRAMs in 0.25 μm CMOS technology using x-ray lithography
- R. Viswanathan
- David Seeger
- et al.
- 1994
- Microelectronic Engineering
Positive mode silylation process characterization
- D.C. La Tulipe
- A.T.S. Pomerene
- et al.
- 1992
- Microelectronic Engineering
A Single Expose Double Develop (SEDD) process for self-aligned lithographic applications
- Donis Flagello
- Andrew Pomerene
- 1989
- Microelectronic Engineering
A GaAs MESFET IC for Optical Multiprocessor Networks
- G.W. Mulvey
- B.K. Ko
- et al.
- 1989
- IEEE T-ED