Comprehensive reliability evaluation of a 90 nm CMOS technology with Cu/PECVD low-k BEOLD. EdelsteinH.S. Rathoreet al.2004IRPS 2004
Comprehensive reliability evaluation of a 90 nm CMOS technology with Cu/PECVD low-k BEOLD. EdelsteinH.S. Rathoreet al.2004IRPS 2004