A high performance 90 nm SOI technology with 0.992 μm2 6T-SRAM cell
- Mukesh Khare
- S. Ku
- et al.
- 2002
- IEDM 2002
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14 results for R. Ferguson
0.18 μm high-performance logic technology
- S.W. Crowder
- S. Greco
- et al.
- 1999
- VLSI Technology 1999
Approach to pattern aspect ratio control
- A. Thomas
- Franz Zach
- et al.
- 1999
- SPIE Advanced Lithography 1999
Lithographic effects of mask critical dimension error
- Alfred K. K. Wong
- Richard A. Ferguson
- et al.
- 1998
- SPIE Advanced Lithography 1998
Electrical characterization of across-field lithographic performance for 256m bit dram technologies
- Junichiro Iba
- Kohji Hashimoto
- et al.
- 1995
- SPIE Photomask Japan 1995
Optimization of resolution-enhanced photolithography for a 256Mb DRAM cell
- R. Ferguson
- Christopher P. Ausschnitt
- et al.
- 1994
- VLSI Technology 1994
A comprehensive evaluation of major phase shift mask technologies for isolated gate sinictuies in logic designs
- Lars W. Liebmann
- Thomas H. Newman
- et al.
- 1994
- Microlithography 1994
Impact of attenuated mask topography on lithographic performance
- Richard A. Ferguson
- William J. Adair
- et al.
- 1994
- Microlithography 1994
Application of the Aerial Image Measurement System (AIMSTM) to the Analysis of Binary Mask Imaging and Resolution Enhancement Techniques
- R. Martino
- R. Ferguson
- et al.
- 1994
- Microlithography 1994
When is bilayer thin-film imaging suitable: Comparison with single layer resists
- Scott Halle
- Alan Thomas
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering