The mask error factor in optical lithography
- Alfred K. Wong
- Richard A. Ferguson
- et al.
- 2000
- IEEE Trans Semicond Manuf
Publications
Date
Featured collections
Popular topics
14 results for R. Ferguson
Level-specific lithography optimization for 1-Gb DRAM
- Alfred K. Wong
- Richard Ferguson
- et al.
- 2000
- IEEE Trans Semicond Manuf
Lithographic evaluation of a DUV carbon attenuated phase shift mask
- A.C. Callegan
- K. Babich
- et al.
- 1998
- Microelectronic Engineering
The application of deep UV phase shifted-single layer halftone reticles to 256 mbit dynamic random access memory cell patterns
- Kohji Hashimoto
- Donald J. Samuels
- et al.
- 1994
- Japanese Journal of Applied Physics