High-aspect-ratio cylindrical nanopore arrays and their use for templating titania nanoposts
- Oun-Ho Park
- Joy Y. Cheng
- et al.
- 2008
- Advanced Materials
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17 results for Mark W. Hart
Controlling linewidth roughness in step and flash imprint lithography
- Gerard M. Schmid
- Niyaz Khusnatdinov
- et al.
- 2008
- EMLC 2008
Self-aligned, self-assembled organosilicate line patterns of ∼20nm half-pitch from block copolymer mediated self-assembly
- Ho-Cheol Kim
- Joy Cheng
- et al.
- 2007
- SPIE Advanced Lithography 2007
Impact of curing kinetics and materials properties on imprint characteristics of resists for UV nanoimprint lithography
- Frances A. Houle
- Ann Fornof
- et al.
- 2007
- SPIE Advanced Lithography 2007
Vinyl ether resist system for UV-cured nanoimprint lithography
- Hiroshi Ito
- Frances A. Houle
- et al.
- 2006
- SPIE Advanced Lithography 2006
Magnetic and recording properties of Co/Pd islands on prepatterned substrates
- G. Hu
- T. Thomson
- et al.
- 2004
- Journal of Applied Physics
Magnetic recording on patterned media
- M. Albrecht
- C.T. Rettner
- et al.
- 2003
- NAPMRC 2003
Contact molding for nanoscopic pattern transfer
- Kenneth R. Carter
- Bruce D. Terris
- et al.
- 2002
- ACS National Meeting 2002
Nanoimprint materials systems
- F.A. Houle
- D.C. Miller
- et al.
- 2008
- J. Photopolym. Sci. Tech.
Minimizing linewidth roughness in Step and Flash Imprint Lithography
- Niyaz Khusnatdinov
- Gerard M. Schmid
- et al.
- 2008
- Microelectronic Engineering