Patterning of N:Ge2Sb2Te5 films and the characterization of etch induced modification for non-volatile phase change memory applicationsE. JosephT.D. Happet al.2008VLSI-TSA 2008
Novel one-mask self-heating pillar phase change memoryT.D. HappM. Breitwischet al.2006VLSI Technology 2006