Towards electrical testable soi devices using directed self-assembly for fin formation
- Chi Chun Liu
- Cristina Estrada-Raygoza
- et al.
- 2014
- SPIE Advanced Lithography 2014
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39 results for Kafai Lai
Computational aspects of optical lithography extension by Directed Self-Assembly
- Kafai Lai
- Chi-Chun Liu
- et al.
- 2013
- SPIE Advanced Lithography 2013
Fast source independent estimation of lithographic difficulty supporting large scale source optimization
- David Demaris
- Maria Gabrani
- et al.
- 2012
- SPIE Advanced Lithography 2012
Progress towards the integration of optical proximity correction and directed self-assembly of block copolymers with graphoepitaxy
- Chi-Chun Liu
- Jed Pitera
- et al.
- 2012
- SPIE Advanced Lithography 2012
Radiometric consistency in source specifications for photolithography
- Alan E. Rosenbluth
- Jaione Tirapu Azpiroz
- et al.
- 2011
- COSI 2011
Total Source Mask Optimization: High-capacity, resist modeling, and production-ready mask solution
- Moutaz Fakhry
- Yuri Granik
- et al.
- 2011
- SPIE Photomask Technology + EUV Lithography 2011
Understanding the trade-offs of thinner binary mask absorbers
- Jaione Tirapu-Azpiroz
- Gregory McIntyre
- et al.
- 2010
- SPIE Photomask Technology + EUV Lithography 2010
Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations
- David Melville
- Alan E. Rosenbluth
- et al.
- 2010
- SPIE Advanced Lithography 2010
SMO photomask inspection in the lithographic plane
- Emily Gallagher
- Karen Badger
- et al.
- 2009
- SPIE Photomask Technology + EUV Lithography 2009
Benefits and trade-offs of global source optimization in optical lithography
- Kehan Tian
- Azalia Krasnoperova
- et al.
- 2009
- SPIE Advanced Lithography 2009