Resist requirements and limitations for nanoscale electron-beam patterning
- J. Alexander Liddle
- Gregg M. Gallatin
- et al.
- 2002
- MRS Proceedings 2002
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16 results for Gregg M. Gallatin
Methodology for generating exposure tool specification for alternating phase shift mask application for 70 nm node
- Kafai Lai
- Gregg Gallatin
- et al.
- 2002
- SPIE Advanced Lithography 2002
EUV photoresist performance results from the VNL and the EUV LLC
- Jonathan Cobb
- Paul Dentinger
- et al.
- 2002
- Proceedings of SPIE - The International Society for Optical Engineering
High-numerical-aperture scalar imaging
- Gregg M. Gallatin
- 2001
- Applied Optics
Generalized Goldstone theorem: Automatic imposition of the Higgs mechanism and application to scale and conformal symmetry breaking
- A. Chodos
- G.M. Gallatin
- 2001
- Journal of Mathematical Physics
Continuum model of shot noise and line edge roughness
- G.M. Gallatin
- 2001
- Microelectronic and MEMS Technologies 2001