Statistical limitations of printing 50 and 80 nm contact holes by EUV lithography
- G.M. Gallatin
- F.A. Houle
- et al.
- 2003
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
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5 results for Jonathan Cobb
Extendibility of chemically amplified amplified resists: Another brick wall?
- William Hinsberg
- Frances Houle
- et al.
- 2003
- Microlithography 2003
The estimated impact of shot noise in extreme ultraviolet lithography
- Jonathan Cobb
- Frances Houle
- et al.
- 2003
- Microlithography 2003
EUV photoresist performance results from the VNL and the EUV LLC
- Jonathan Cobb
- Paul Dentinger
- et al.
- 2002
- Proceedings of SPIE - The International Society for Optical Engineering
Dynamics of a Charged Fluctuator in an Al-AlOx-Al Single-Electron Transistor
- M. Kenyon
- J.L. Cobb
- et al.
- 2001
- Journal of Low Temperature Physics