Statistical limitations of printing 50 and 80 nm contact holes by EUV lithography

Thomas E. Karis, C. Mark Seymour, et al.

Rheologica Acta

Kafai Lai, Alan E. Rosenbluth, et al.

SPIE Advanced Lithography 2007

A. Reisman, M. Berkenblit, et al.

JES

S. Cohen, J.C. Liu, et al.

MRS Spring Meeting 1999