In situ analysis of the formation of thin TiSi2 (<50 nm) contacts in submicron CMOS structures during rapid thermal annealing
- L. Clevenger
- C. Cabral Jr.
- et al.
- 1995
- MRS Fall Meeting 1995
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5 results for G. Morales
In-situ x-ray diffraction and resistivity analysis of CoSi2 phase formation with and without a Ti interlayer at rapid thermal annealing rates
- C. Cabral Jr.
- L. Clevenger
- et al.
- 1994
- MRS Fall Meeting 1994
Phase formation sequences in the silicon-phosphorus system: Determined by in-situ synchrotron and conventional X-ray diffraction measurements and predicted by a theoretical model
- J.R.A. Carlsson
- L. Clevenger
- et al.
- 1997
- Philosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties
Formation of a crystalline metal-rich suicide in thin film titanium/silicon reactions
- L. Clevenger
- C. Cabral Jr.
- et al.
- 1996
- Thin Solid Films
In situ x-ray diffraction analysis of the C49-C54 titanium silicide phase transformation in narrow lines
- R.A. Roy
- L. Clevenger
- et al.
- 1995
- Applied Physics Letters