In situ TEM analysis of TiSi2 C49-C54 transformations during annealingL. GignacV. Svilanet al.1996MRS Fall Meeting 1996
Film crystallographic texture and substrate surface roughness in layered aluminum metallizationK.P. RodbellV. Svilanet al.1996MRS Spring Meeting 1996
Dependence of crystallographic texture of C54 TiSi2 on thickness and linewidth in submicron CMOS structuresV. SvilanK.P. Rodbellet al.1996MRS Spring Meeting 1996
Crystallographic texture of C54 titanium disilicide as a function of deep submicron structure geometryV. SvilanK.P. Rodbellet al.1997Journal of Electronic Materials