Publications

3 results for Pete Hagerty

Design, preparation, characterization, and lithographic imaging of high performance chemically amplified deep UV resist
- - Hiroshi Ito
  - G. Breyta
  - et al.
- 1997
- ACS Spring 1997
A new positive DUV photoresist optimized for 0.25 μm isolated lines
- - T. Lindsay
  - G.G. Barclay
  - et al.
- 1997
- Microelectronic Engineering
Lithographic feasibility of escap beyond quarter micron
- - Hiroshi Ito
  - Greg Breyta
  - et al.
- 1996
- J. Photopolym. Sci. Tech.