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Characterization and monitoring of silicon-on-insulator fabrication processes by high-resolution x-ray diffractionG.M. CohenP.M. Mooneyet al.2002MRS Proceedings 2002
A self-aligned silicide process utilizing ion implants for reduced silicon consumption and control of the silicide formation temperatureG.M. CohenC. Cabral Jr.et al.2002MRS Proceedings 2002
A self-aligned silicide process for thin silicon-on-insulator MOSFETs and bulk MOSFETs with shallow junctionsG.M. CohenC. Cabral Jr.et al.2001MRS Proceedings 2001
A patterned SOI by masked anneal for system-on-chip applicationsG.M. CohenD.K. Sadana2001MRS Proceedings 2001
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