Publications

34 results for A. Mahorowala

Application of blends and side chain Si-O copolymers as high etch resistant sub 100 nm E-beam resists
- - Wu-Song Huang
  - Ranee Kwong
  - et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Fabrication challenges for next generation devices: MEMS for RF wireless communications
- - David Seeger
  - Jennifer Lund
  - et al.
- 2002
- Proceedings of SPIE - The International Society for Optical Engineering
A high performance E-beam resist coupling excellent dry etch resistance and sub 100nm resolution for advanced mask making
- - Wu-Song Huang
  - Ranee Kwong
  - et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Characterization of new aromatic polymers for 157 nm photoresist applications
- - N. Fender
  - P.J. Brock
  - et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
IBM 193nm bilayer resist: Materials, lithographic performance and optimization
- - Ranee Kwong
  - P. Rao Varanasi
  - et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
A high performance E-beam resist coupling excellent dry etch resistance and sub 100nm resolution for advanced mask and device making
- - Wu-Song Huang
  - Ranee Kwong
  - et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Tunable anti-reflective coatings with built-in hard mask properties facilitating thin resist processing
- - Arpan P. Mahorowala
  - Katherina Babich
  - et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Relationship between deprotection and film thickness loss during plasma etching of positive tone chemically amplified resists
- - A. Mahorowala
  - D. Medeiros
- 2001
- Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films
Development of 157 nm positive resists
- - Hiroshi Ito
  - G.M. Wallraff
  - et al.
- 2001
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Recent progress in electron-beam resists for advanced mask-making
- - D. Medeiros
  - A. Aviram
  - et al.
- 2001
- IBM J. Res. Dev