Multiple stages of regression to improve accuracy in calibrated lithography process models
- Pardeep Kumar
- Alan E. Rosenbluth
- et al.
- 2018
- J. Micro/Nanolithogr. MEMS MOEMS
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49 results for Alan E. Rosenbluth
Decomposition of the TCC using non-coherent kernels for faster calculation of lithographic images
- Alan E. Rosenbluth
- 2017
- SPIE Advanced Lithography 2017
Lithography process model building using locally linear embedding
- Pardeep Kumar
- Alan E. Rosenbluth
- et al.
- 2015
- SISPAD 2015
Layout optimization method to equalize the best-focus position of different patterns
- Jaione Tirapu-Azpiroz
- Alan E. Rosenbluth
- et al.
- 2014
- J. Micro/Nanolithogr. MEMS MOEMS
Impact of sub-wavelength electromagnetic diffraction in optical lithography for semiconductor chip manufacturing
- Jaione Tirapu Azpiroz
- Alan E. Rosenbluth
- 2013
- IMOC 2013
Radiometric consistency in source specifications for photolithography
- Alan E. Rosenbluth
- Jaione Tirapu Azpiroz
- et al.
- 2011
- COSI 2011
Applicability of global source mask optimization to 22/20nm node and beyond
- Kehan Tian
- Moutaz Fakhry
- et al.
- 2011
- SPIE Advanced Lithography 2011
Computational lithography: Exhausting the resolution limits of 193-nm projection lithography systems
- David O. S. Melville
- Alan E. Rosenbluth
- et al.
- 2011
- Journal of Vacuum Science and Technology B
Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations
- David Melville
- Alan E. Rosenbluth
- et al.
- 2010
- SPIE Advanced Lithography 2010
Isotropic treatment of EMF effects in advanced photomasks
- Jaione Tirapu Azpiroz
- Alan E. Rosenbluth
- et al.
- 2009
- SPIE Photomask Technology + EUV Lithography 2009