ArF excimer laser resists based on fluoroalcohol
- Hiroshi Ito
- H.D. Truong
- et al.
- 2006
- Polymers for Advanced Technologies
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49 results for Hoa Truong
Investigations of the adhesion of maleic anhydride/cyclic olefin alternating copolymers to silicon substrates: Improved materials for 193 NM lithography
- Anthony J. Pasquale
- Timothy E. Long
- et al.
- 2002
- Journal of Adhesion
Aliphatic platforms for the design of 157 nm chemically amplified resists
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Evolution of a 193 nm bilayer resist for manufacturing
- R.W. Kwong
- M. Khojasteh
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Polymer design for 157 nm chemically amplified resists
- Hiroshi Ito
- Greg M. Wallraff
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
IBM 193nm bilayer resist: Materials, lithographic performance and optimization
- Ranee Kwong
- P. Rao Varanasi
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Characterization of new aromatic polymers for 157 nm photoresist applications
- N. Fender
- P.J. Brock
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
193nm single layer resist materials: Total consideration on design, physical properties, and lithographic performances on all major alicyclic platform chemistries
- T. Kajita
- Y. Nishimura
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Development of 157 nm positive resists
- Hiroshi Ito
- G.M. Wallraff
- et al.
- 2001
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures