Conference paper
Learning Reduced Order Dynamics via Geometric Representations
Imran Nasim, Melanie Weber
SCML 2024
A 157 nm resist design that utilizes a hexafluoroisopropanol as an acidic group and an α-trifluoromethylacrylic moiety as a repeat unit is described. The fluoroalcohol group is pendant form either norbornene or styrene. The residual casting solvent concentration is much smaller in the fluoropolymers than in the hydrocarbon counterparts.
Imran Nasim, Melanie Weber
SCML 2024
Elizabeth A. Sholler, Frederick M. Meyer, et al.
SPIE AeroSense 1997
Sharee J. McNab, Richard J. Blaikie
Materials Research Society Symposium - Proceedings
A. Ney, R. Rajaram, et al.
Journal of Magnetism and Magnetic Materials