A. Ney, R. Rajaram, et al.
Journal of Magnetism and Magnetic Materials
A 157 nm resist design that utilizes a hexafluoroisopropanol as an acidic group and an α-trifluoromethylacrylic moiety as a repeat unit is described. The fluoroalcohol group is pendant form either norbornene or styrene. The residual casting solvent concentration is much smaller in the fluoropolymers than in the hydrocarbon counterparts.
A. Ney, R. Rajaram, et al.
Journal of Magnetism and Magnetic Materials
R. Ghez, J.S. Lew
Journal of Crystal Growth
Mitsuru Ueda, Hideharu Mori, et al.
Journal of Polymer Science Part A: Polymer Chemistry
Sharee J. McNab, Richard J. Blaikie
Materials Research Society Symposium - Proceedings