Design intent optimization at the beyond 7nm node: The intersection of DTCO and EUVL stochastic mitigation techniques
- Michael Crouse
- L. Liebmann
- et al.
- 2017
- SPIE Advanced Lithography 2017
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3 results for Yulu Chen
Printability and actinic AIMS review of programmed mask blank defects
- Erik Verduijn
- Pawitter Mangat
- et al.
- 2017
- SPIE Advanced Lithography 2017
Comparison of left and right side line edge roughness in lithography
- Lei Sun
- Nicole Saulnier
- et al.
- 2016
- SPIE Advanced Lithography 2016