High-resolution three-dimensional structural microscopy by single-angle Bragg ptychography
- Stephan O. Hruszkewycz
- M. Allain
- et al.
- 2016
- Nature Materials
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30 results for Judson R. Holt
Multitechnique metrology methods for evaluating pitch walking in 14 nm and beyond FinFETs
- Robin Chao
- Kriti K. Kohli
- et al.
- 2014
- J. Micro/Nanolithogr. MEMS MOEMS
Strain imaging of nanoscale semiconductor heterostructures with x-ray bragg projection ptychography
- Martin V. Holt
- Stephan O. Hruszkewycz
- et al.
- 2014
- Physical Review Letters
Novel in-line metrology methods for Fin pitch walking monitoring in 14nm node and beyond
- Robin Chao
- Kriti Kohli
- et al.
- 2014
- SPIE Advanced Lithography 2014
Observation of semiconductor device channel strain using in-line high resolution X-ray diffraction
- Judson R. Holt
- Anita Madan
- et al.
- 2013
- Journal of Applied Physics
22nm High-performance SOI technology featuring dual-embedded stressors, Epi-Plate High-K deep-trench embedded DRAM and self-aligned Via 15LM BEOL
- S. Narasimha
- P. Chang
- et al.
- 2012
- IEDM 2012
Quantitative nanoscale imaging of lattice distortions in epitaxial semiconductor heterostructures using nanofocused X-ray Bragg projection ptychography
- S.O. Hruszkewycz
- M.V. Holt
- et al.
- 2012
- Nano Letters
SIMS quantification of SiGe composition with low-energy ion beams
- Zhengmao Zhu
- Paul Ronsheim
- et al.
- 2011
- Surface and Interface Analysis
FinFET resistance mitigation through design and process optimization
- Cindy Wang
- Josephine Chang
- et al.
- 2009
- VLSI-TSA 2009
Fully depleted extremely thin SOI technology fabricated by a novel integration scheme featuring implant-free, zero-silicon-loss, and faceted raised source/drain
- K. Cheng
- A. Khakifirooz
- et al.
- 2009
- VLSI Technology 2009