Design technology co-optimization assessment for directed self-Assembly-based lithography: Design for directed self-Assembly or directed self-Assembly for design
- Kafai Lai
- Chi Chun Liu
- et al.
- 2017
- J. Micro/Nanolithogr. MEMS MOEMS
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14 results for Todd Bailey
Methodology for determining critical dimension scanning electron microscope measurement condition of sub-20 nm resist patterns for 0.33 NA extreme ultraviolet lithography
- Nobuhiro Okai
- Erin Lavigne
- et al.
- 2016
- J. Micro/Nanolithogr. MEMS MOEMS
Multitechnique metrology methods for evaluating pitch walking in 14 nm and beyond FinFETs
- Robin Chao
- Kriti K. Kohli
- et al.
- 2014
- J. Micro/Nanolithogr. MEMS MOEMS
Leveraging advanced data analytics, machine learning, and metrology models to enable critical dimension metrology solutions for advanced integrated circuit nodes
- Narender Rana
- Yunlin Zhang
- et al.
- 2014
- J. Micro/Nanolithogr. MEMS MOEMS