High-aspect-ratio resist for thick-film applications
- N. LaBianca
- J. Gelorme
- 1995
- Microlithography 1995
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29 results for Jeffrey Gelorme
Electrically conducting polyanilines for electrostatic dissipation
- Marie Angelopoulos
- J. Gelorme
- et al.
- 1994
- EOS/ESD 1994
High performance photosensitive polyimide based on a BPDA/PDA/6FDAm copolymer
- Marie Angelopoulos
- J. Gelorme
- et al.
- 1994
- ANTEC Annual Technical Conference 1994
Low stress, high resolution photosensitive polyimide based on a BPDA/ PDA/6FDAm copolymer
- Marie Angelopoulos
- J. Gelorme
- et al.
- 1993
- MRS Fall Meeting 1993
High-speed aqueous-developing negative resist based on triflic-acid-catalyzed epoxy polymerization
- R.D. Allen
- Willard E. Conley
- et al.
- 1992
- Microlithography 1992
Comparison of vapor and liquid phase silylation processes of photoresists
- E. Babich
- J. Paraszczak
- et al.
- 1991
- Microelectronic Engineering
Silylation of (photo)resist materials using polyfunctional organosilicon compounds
- E. Babich
- J. Paraszczak
- et al.
- 1989
- ACS National Meeting 1989
Negative tone aqueous developable resist for photon electron and X-ray lithography
- Willard Conley
- Wayne Moreau
- et al.
- 1990
- Microlithography 1990
Polymeric optical waveguides
- J.M. Hagerhorst-Trewhella
- J. Gelorme
- et al.
- 1989
- Proceedings of SPIE 1989