Formation of an amorphous Rh-Si alloy by interfacial reaction between amorphous Si and crystalline Rh thin films
- S.R. Herd
- K.N. Tu
- et al.
- 1983
- Applied Physics Letters
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230 results for King-Ning Tu
Reduction of contact resistivity by As redistribution during Pd 2Si formation
- I. Ohdomari
- M. Hori
- et al.
- 1983
- Journal of Applied Physics
Redistribution of As during Pd2Si formation: Electrical measurements
- M. Wittmer
- C.-Y. Ting
- et al.
- 1983
- Journal of Applied Physics
Formation and crystallization of amorphous silicides at the interface between thin metal and amorphous silicon films
- S.R. Herd
- K.Y. Ahn
- et al.
- 1983
- Thin Solid Films
Atomic motion of dopant during interfacial silicide formation
- M. Wittmer
- C.-Y. Ting
- et al.
- 1983
- Thin Solid Films
Oxidation behavior of PdSi compounds
- A. Cros
- R.A. Pollak
- et al.
- 1983
- Thin Solid Films
Growth kinetics and diffusion mechanism in Pd2Si
- M. Wittmer
- K.N. Tu
- 1983
- Physical Review B
Motion of W marker during sequential compound formation in bimetallic AlCu thin films
- H.T.G. Hentzell
- R.D. Thompson
- et al.
- 1983
- Materials Letters
High-sensitivity silicide films for optical recording
- K.Y. Ahn
- T.H. Distefano
- et al.
- 1982
- Journal of Applied Physics
Schottky barrier of nonuniform contacts to n-type and p-type silicon
- R.D. Thompson
- K.N. Tu
- 1982
- Journal of Applied Physics