Scaling opportunities for Gate-All-Around: A patterning perspective
- I. Seshadri
- E. Miller
- et al.
- 2023
- IEDM 2023
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21 results for Jennifer Church
The Extreme Extendibility of Cu and Post-Cu Dual Damascene BEOL Interconnect Technology
- Daniel Edelstein
- Son Nguyen
- et al.
- 2024
- IEDM 2024
Scaling opportunities for Gate-All-Around and beyond: A patterning perspective
- Indira Seshadri
- Eric Miller
- et al.
- 2023
- IEDM 2023
A novel single damascene process for via metal corrosion-free interconnects in advanced nodes
- Koichi Motoyama
- Dominik Metzler
- et al.
- 2024
- IITC 2024
EUV patterned gate variation reduction in next generation transistor architectures
- Gopal Kenath
- Martin Burkhardt
- et al.
- 2024
- SPIE Advanced Lithography + Patterning 2024
Exploring the stochastics cliff: Understanding the impact of LER/LWR to stochastic defectivity and yield
- Jennifer Church
- Graham Jensen
- et al.
- 2021
- SPIE Photomask Technology + EUV Lithography 2021
A holistic characterization methodology for stochastic printing failures in EUV contact holes
- Jennifer Church
- Brad Austin
- et al.
- 2021
- ASMC 2021
EUV single exposure via patterning at aggressive pitch
- Jing Guo
- Jennifer Church
- et al.
- 2021
- SPIE Advanced Lithography 2021
Contact local CD uniformity optimization through etch shrink
- Eric Miller
- Junling Sun
- et al.
- 2021
- SPIE Advanced Lithography 2021
Nanosheet Metrology Opportunities for Technology Readiness
- Mary Breton
- Daniel Schmidt
- et al.
- 2021
- SPIE Advanced Lithography 2021