200 mm wafer-scale integration of sub-20 nm sacrificial nanofluidic channels for manipulating and imaging single DNA molecules
- C. Wang
- S.W. Nam
- et al.
- 2013
- IEDM 2013
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65 results for Michael Guillorn
Subtractive W contact and local interconnect co-integration (CLIC)
- Fei Liu
- Benjamin Fletcher
- et al.
- 2013
- IITC 2013
Dot-matrix marks for dynamic overlay measurements in electron beam lithography
- Ernst Kratschmer
- James J. Bucchignano
- et al.
- 2013
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Pattern transfer of directed self-assembly (DSA) patterns for CMOS device applications
- Hsin-Yu Tsai
- Hiroyuki Miyazoe
- et al.
- 2013
- SPIE Advanced Lithography 2013
Computational aspects of optical lithography extension by Directed Self-Assembly
- Kafai Lai
- Chi-Chun Liu
- et al.
- 2013
- SPIE Advanced Lithography 2013
Ultra low contact resistivities for CMOS beyond 10-nm node
- Zhen Zhang
- Siyuranga Obasa Koswatta
- et al.
- 2013
- IEEE Electron Device Letters
Pattern transfer of directed self-assembly patterns for CMOS device applications
- Hsin-Yu Tsai
- Hiroyuki Miyazoe
- et al.
- 2013
- J. Micro/Nanolithogr. MEMS MOEMS
Patterning of CMOS device structures for 40-80nm pitches and beyond
- Sebastian U. Engelmann
- R.M. Martin
- et al.
- 2012
- SPIE Advanced Lithography 2012
Statistical measurement of random telegraph noise and its impact in scaled-down high-κ/metal-gate MOSFETs
- H. Miki
- N. Tega
- et al.
- 2012
- IEDM 2012
Room-temperature carrier transport in high-performance short-channel Silicon nanowire MOSFETs
- Amlan Majumdar
- Sarunya Bangsaruntip
- et al.
- 2012
- IEDM 2012