Ultimate 2D resolution printing with negative tone development
- Martin Burkhardt
- Yongan Xu
- et al.
- 2016
- SPIE Advanced Lithography 2016
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33 results for Martin Burkhardt
EUV patterning successes and frontiers
- Nelson Felix
- Daniel Corliss
- et al.
- 2016
- SPIE Advanced Lithography 2016
Best focus shift mechanism for thick masks
- Martin Burkhardt
- Ananthan Raghunathan
- 2015
- SPIE Advanced Lithography 2015
Implementation of assist features in EUV lithography
- Fan Jiang
- Martin Burkhardt
- et al.
- 2015
- SPIE Advanced Lithography 2015
Toward defect guard-banding of EUV exposures by full chip optical wafer inspection of EUV mask defect adders
- Scott D. Halle
- Luciana Meli
- et al.
- 2015
- SPIE Advanced Lithography 2015
Clear sub-resolution assist features for EUV
- Martin Burkhardt
- Greg McIntyre
- et al.
- 2014
- SPIE Advanced Lithography 2014
Enhancing resolution with pupil filtering for projection printing systems with fixed or restricted illumination angular distribution
- Greg McIntyre
- Leon Teeuwen
- et al.
- 2013
- SPIE Advanced Lithography 2013
Spacer-defined double patterning for 20-nm and beyond logic BEOL technology
- Ryoung-Han Kim
- Chiew-Seng Koay
- et al.
- 2011
- SPIE Advanced Lithography 2011
EUV OPC for 56 nm metal pitch
- Martin Burkhardt
- Matt Colburn
- et al.
- 2011
- SPIE Advanced Lithography 2011
Fundamental investigation of Negative Tone Development (NTD) for the 22nm node (and beyond)
- Guillaume Landie
- Yongan Xu
- et al.
- 2011
- SPIE Advanced Lithography 2011