Spacer defined double patterning for sub-72 nm pitch logic technology
- Ryoung-Han Kim
- Erin McLellan
- et al.
- 2010
- SPIE Advanced Lithography 2010
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33 results for Martin Burkhardt
Thorough characterization of a EUV mask
- Hiroyuki Mizuno
- Gregory McIntyre
- et al.
- 2009
- Photomask and Next-Generation Lithography Mask Technology 2009
Modeling and experiments of non-telecentric thick mask effects for EUV lithography
- Gregory McIntyre
- Chiew-Seng Koay
- et al.
- 2009
- SPIE Advanced Lithography 2009
Flare evaluation of ASML alpha demo tool
- Hiroyuki Mizuno
- Gregory McIntyre
- et al.
- 2009
- SPIE Advanced Lithography 2009
Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process
- Kafai Lai
- Alan E. Rosenbluth
- et al.
- 2009
- SPIE Advanced Lithography 2009
32 NM Logic patterning options with immersion lithography
- K. Lai
- S. Burns
- et al.
- 2008
- SPIE Advanced Lithography 2008
Use of starburst patterns in optical lithography
- M. Burkhardt
- Cyrus Tabery
- 2007
- SPIE Advanced Lithography 2007
Dark field Double Dipole Lithography (DDL) for back-end-of-line processes
- M. Burkhardt
- Sean Burns
- et al.
- 2007
- SPIE Advanced Lithography 2007
Dark field double dipole lithography (DDL) for 45nm node and beyond
- Stephen Hsu
- Martin Burkhardt
- et al.
- 2006
- Photomask and Next-Generation Lithography Mask Technology 2006
Trilayer development for 193 nm immersion lithography
- Sean Burns
- Martin Burkhardt
- et al.
- 2007
- J. Photopolym. Sci. Tech.