Oxygen stoichiometry in PdOx and PdOxPt electrode layers during processing of ferroelectric and high-epsilon perovskites
- K.L. Saenger
- C. Cabral Jr.
- et al.
- 2000
- Journal of Materials Research
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162 results for Cyril Cabral
Optimization of Ta-Si-N thin films for use as oxidation-resistant diffusion barriers
- C. Cabral
- K.L. Saenger
- et al.
- 2000
- Journal of Materials Research
Mechanisms for enhanced formation of the C54 phase of titanium silicide ultra-large-scale integration contacts
- J.M.E. Harper
- C. Cabral Jr.
- et al.
- 2000
- Annual Review of Materials Science
Fabrication and performance limits of sub-0.1 μm Cu interconnects
- T.S. Kuan
- C.K. Inoki
- et al.
- 2000
- Materials Research Society Symposium-Proceedings
Microstructural analysis of copper interconnections using picosecond ultrasonics
- James M.E. Harper
- Sandra G. Malhotra
- et al.
- 2000
- Materials Research Society Symposium-Proceedings
Thermal stability and oxygen-loss characteristics of Pt(O) films prepared by reactive sputtering
- K.L. Saenger
- C. Cabral Jr.
- et al.
- 1999
- Journal of Applied Physics
Phase formation and resistivity in the ternary system Ti-Nb-Si
- Aliette Mouroux
- Marylène Roux
- et al.
- 1999
- Journal of Applied Physics
Mechanisms for enhanced C54-TiSi2 formation in Ti-Ta alloy films on single-crystal Si
- A. Quintero
- M. Libera
- et al.
- 1999
- Journal of Materials Research
In situ characterization of titanium silicide formation: The effect of Mo interlayer, temperature ramp-rate, and annealing atmosphere
- S.-L. Zhang
- C. Lavoie
- et al.
- 1999
- Journal of Applied Physics
Al-Ta bilayer as an oxidation resistant barrier for electrode structures in high dielectric constant capacitors
- A. Grill
- C. Cabral Jr.
- 1999
- Journal of Materials Research