Deep learning acceleration in 14nm CMOS compatible ReRAM array: device, material and algorithm co-optimization
- N. Gong
- Malte J. Rasch
- et al.
- 2022
- IEDM 2022
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11 results for Kandabara Tapily
A Novel Dry Selective Etch of SiGe for the Enablement of High Performance Logic Stacked Gate-All-Around NanoSheet Devices
- Nicolas Loubet
- T. Devarajan
- et al.
- 2019
- IEDM 2019
Resistive Memory Process Optimization for High Resistance Switching Toward Scalable Analog Compute Technology for Deep Learning
- Youngseok Kim
- Soon-Cheon Seo
- et al.
- 2021
- IEEE Electron Device Letters
Hardware Algorithm Co-optimization on Resistive RAM Cross-bar Array for Scalable Analog Compute Technology for AI application
- Y. Kim
- S.-C. Seo
- et al.
- 2021
- SNW 2021
Process-Induced ReRAM Performance Improvement of Atomic Layer Deposited HfO2 for Analog In-Memory Computing Applications
- Steven Consiglio
- H. Higuchi
- et al.
- 2021
- IMCS 2021
Higher-K formation in atomic layer deposited Hf1-xAlxOy
- Kandabara Tapily
- Steven Consiglio
- et al.
- 2014
- ECSSMEQ 2014
Quantifying non-centrosymmetric orthorhombic phase fraction in 10 nm ferroelectric Hf0.5Zr0.5O2films
- Vineetha Mukundan
- Steven Consiglio
- et al.
- 2020
- Applied Physics Letters
Atomic layer deposited ultrathin metal nitride barrier layers for ruthenium interconnect applications
- Sonal Dey
- Kai-Hung Yu
- et al.
- 2017
- JVSTA
Electrical enhancement and higher-k engineering in ultra-thin atomic layer deposited Hf1-xAlxOy films
- K. Tapily
- S. Consiglio
- et al.
- 2014
- ECS J. Solid State Sci. Technol.
Engineering crystallinity of atomic layer deposited gate stacks containing ultrathin HfO2and a Ti-based metal gate: Effects of postmetal gate anneal and integration schemes
- Steven Consiglio
- Kandabara Tapily
- et al.
- 2014
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures