Methodology of ALD HfO2 high-κ gate dielectric optimization by cyclic depositions and anneals
- H. Jagannathan
- Robert D. Clark
- et al.
- 2010
- ECS Transactions
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79 results for Marinus Hopstaken
Ultimate EOT scaling (< 5Å) using Hf-based high-κ gate dielectrics and impact on carrier mobility
- Takashi Ando
- Martin M. Frank
- et al.
- 2010
- ECS Transactions
Towards routine backside SIMS sample preparation for efficient support of advanced IC process development
- M. Hopstaken
- C. Cabral Jr.
- et al.
- 2009
- FCMN 2009
Low-temperature epitaxy of compressively strained silicon directly on silicon substrates
- Davood Shahrjerdi
- Bahman Hekmatshoar
- et al.
- 2011
- Journal of Electronic Materials
Disorder-Induced Magnetotransport Anomalies in Amorphous and Textured Co1- xSix Semimetal Thin Films
- Alan Molinari
- Federico Balduini
- et al.
- 2023
- ACS Applied Electronic Materials
Atomic Layer Deposition of Tungsten Oxide Using Nitrogen Dioxide: A Comparative Study with Other Oxygen Sources
- Damon B. Farmer
- Matthew Copel
- et al.
- 2021
- Chemistry of Materials
Investigating microwave loss of SiGe using superconducting transmon qubits
- Martin Sandberg
- Vivekananda P. Adiga
- et al.
- 2021
- Applied Physics Letters
High-speed CMOS-compatible III-V on Si membrane photodetectors
- Yannick Baumgartner
- Daniele Caimi
- et al.
- 2020
- Optics Express
Diffusion-Controlled Porous Crystalline Silicon Lithium Metal Batteries
- John Collins
- Joel P. de Souza
- et al.
- 2020
- iScience
Atomic layer epitaxy of InAs with high silicon doping concentration
- Doron Cohen Elias
- Guy Cohen
- et al.
- 2020
- JVSTA